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Summary

GSR065E030

GSR065E030 is an enhanced GaN on Silicon power transistor. The characteristics of GaN allow high current, high breakdown voltage and high switching frequency. This is a bottom cooled transistor, which can provide extremely low shell thermal resistance for demanding high-power applications. GSR semiconductor uses advanced epitaxy and design technologies to simplify manufacturability while improving efficient power switches.

Gallium nitride chip gallium nitride third generation semiconductor Jinshajiang semiconductor
Detail DataSheet

Features 

  • 650 V enhancement mode power transistor 
  • Bottom-cooled, 8x8 mm PDFN package 
  • RDS(on) = 50 mΩ  
  • IDS(max) = 30 A 
  • Simple gate drive requirements (0 V to 6 V) 
  • Transient tolerant gate drive (-20 V / +10 V) 
  • High switching frequency (> 1 MHz) 
  • Fast and controllable fall and rise times 
  • Reverse conduction capability 
  • Zero reverse recovery loss 
  • Source Sense (SS) pin for optimized gate drive 

Applications 

  • Bridgeless Totem Pole PFC 
  • Consumer, Industrial and Datacenter High Density Power Supply 
  • High Power Adapters 
  • LED Lighting Drivers 
  • Appliance and Industrial Motor Drives 
  • Solar Inverter 
  • Uninterruptable Power Supplies 
  • Laser Drivers 
  • Wireless Power Transfer 

Description 

The GSR065E030 is an enhancement mode GaNon-Silicon power transistor. The properties of GaN allow for high current, high voltage breakdown and high switching frequency. The GSR065E030 is a bottom-side cooled transistor that offers low junction-to-case thermal resistance for demanding high power applications. These features combine to provide very high efficiency power switching. 

 

Absolute Maximum Ratings (Tcase = 25 °C except as noted) 

Parameter Symbol Value Unit   
Operating Junction Temperature TJ-55 to +150  °C 
Storage Temperature Range TS-55 to +150  °C 
Drain-to-Source Voltage VDS 650 
Drain-to-Source Voltage - transient (Note 1) VDS(transient) 850 
Gate-to-Source Voltage VGS -10 to +7 
Gate-to-Source Voltage - transient (Note 1) VGS(transient) -20 to +10 
Continuous Drain Current (Tcase = 25 °C) IDS 30 
Continuous Drain Current (Tcase = 100 °C) IDS 20 
Pulse Drain Current (Pulse width 10 µs, VGS = 6 V) (Note 2) IDS Pulse 60 
  1. For < 100 µs 
  2. Defined by product design and characterization. Value is not tested to full current in production. 

Thermal Characteristics (Typical values unless otherwise noted) 

Parameter Symbol Value Units 
Thermal Resistance (junction-to-case) – bottom side RΘJC 0.5 °C / W 
Thermal Resistance (junction-to-ambient) (Note 3) RΘJA 35 °C / W 
Maximum Soldering Temperature (MSL3 rated) TSOLD 260 °C 
  1. Device mounted on 1.6 mm PCB thickness FR4, 4-layer PCB with 2 oz. copper on each layer. The recommendation for thermal vias under the thermal pad is 0.3 mm diameter (12 mil) with 0.635 mm pitch (25 mil). The copper layers under the thermal pad and drain pad are 25 x 25 mm2 each. The PCB is mounted in horizontal position without air stream cooling. 

Ordering Information 

Ordering code Package type Packing method Qty Reel Diameter Reel Width 
GS-065-030-2-L-TR  8x8 mm PDFN Tape-and-Reel  3000 13” (330 mm) 16 mm 
GS-065-030-2-L-MR  8x8 mm PDFN Mini-Reel  250 7” (180 mm) 16 mm 

 

Electrical Characteristics (Typical values at TJ = 25 °C, VGS = 6 V unless otherwise noted) 

Parameters Sym. Min. Typ. Max. Units Conditions 
Drain-to-Source Blocking Voltage V(BL)DSS 650   VGS = 0 V, IDSS ≤ 58 µA 
Drain-to-Source On Resistance RDS(on)  50 68 mΩ 

VGS = 6 V, TJ = 25°C 

IDS = 5.5 A 

Drain-to-Source On Resistance RDS(on)  127  mΩ 

VGS = 6 V, TJ = 150 °C 

IDS = 5.5 A 

Gate-to-Source Threshold VGS(th) 1.1 1.7 2.6 VDS = VGS, IDS = 7.5 mA 
Gate-to-Source Current IGS  182  µA VGS = 6 V, VDS = 0 V 
Gate Plateau Voltage Vplat  3.5  VDS = 400 V, IDS = 30 A 
Drain-to-Source Leakage Current IDSS  58 µA 

VDS = 650 V, VGS = 0 V 

TJ = 25 °C 

Drain-to-Source Leakage Current IDSS  70  µA 

VDS = 650 V, VGS = 0 V 

TJ = 150 °C 

Internal Gate Resistance RG 1.3  Ω f = 5 MHz, open drain 
Input Capacitance CISS  235  pF VDS = 400 V VGS = 0 V f = 100 kHz 
Output Capacitance COSS  60  pF 
Reverse Transfer Capacitance CRSS  0.6  pF 

Effective Output Capacitance 

Energy Related (Note 4) 

CO(ER)  96  pF 

VGS = 0 V 

VDS = 0 to 400 V 

Effective Output Capacitance 

Time Related (Note 5) 

CO(TR)  150  pF 
Total Gate Charge QG 6.7  nC 

VGS = 0 to 6 V 

VDS = 400 V 

Gate-to-Source Charge Q GS 1.9  nC 
      
Gate-to-Drain Charge QGD   nC  
Output Charge QOSS  61  nC VGS = 0 V, VDS = 400 V 
Reverse Recovery Charge QRR  nC  

 

  1. CO(ER) is the fixed capacitance that would give the same stored energy as COSS while VDS is rising from 0 V to the stated VDS 
  2. CO(TR) is the fixed capacitance that would give the same charging time as COSS while VDS is rising from 0 V to the stated VDS. 

Electrical Characteristics cont’d (Typical values at TJ = 25 °C, VGS = 6 V unless otherwise noted)  

Parameters Sym. Min.   Typ. Max. Units Conditions 
Turn-On Delay tD(on)  8.2  ns 

VDD = 400 V, VGS = +6/-3 V, 

IDS = 15 A, 

RG(on) = 15 Ω, RG(off) = 2 Ω, 

L = 90 µH, LP = 12 nH 

(Notes 6, 7, 8) 

Rise Time t R 6.3  ns 
Turn-Off Delay tD(off)  10.8  ns 
Fall Time tF 5.7  ns 
Switching Energy during turn-on Eon  50  µJ 
Switching Energy during turn-off Eoff  10  µJ 

Output Capacitance Stored 

Energy 

E OSS   µJ  

VDS = 400 V 

VGS = 0 V, f = 100 kHz 

  1. See Figure 16 for switching test circuit diagram. 
  2. See Figure 17 for switching time definition waveforms. 
  3. LP = parasitic inductance. 
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Ganhonor Semiconductor Co., Ltd

Ganhonor Semiconductor Co., Ltd. was established in 2021. The project initiator is a leader in the field of gallium nitride (GaN、GaN HEMT、GaN FET). With the industry-leading gallium nitride power devices and their new applications as the flagship products, it takes the full advantages of the world's leading manufacturing technologies on the 6-8 inch GaN-on-Silicon power electronics platform, and the synergy of supply chain resources, core technology, manufacturing capability, key customers, capital market, local organization support and other key resources. This provides a new IDM platform to help achieve leapfrog development in the industry of the third generation semiconductors.

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